PRODUCT

Delivering Innovative Plasma Solutions.

MaHa

Magnetic Harmonic Sensor

MaHa

Non-Invasive Sensor for Continuous Plasma Monitoring Without Process Interruption

  • The MaHa sensor is a harmonic-based, non-contact plasma monitoring sensor that can be installed outside the process chamber. It enables real-time acquisition of multiple physical parameters, including plasma nonlinearity, sheath characteristics, impedance, RF power loss, and chamber wall conditions.

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MaHa Sensor Head

Hardware Specifications

Parameter Specification
Frequency Range 10 ~ 150 MHz
Hole Diameter 10 mm
Connector Type SMA / LAN
Band-Pass Filter (BPF) Built-in 13 MHz
Gain Adjustment Adjustable Gain Knob
최대 허용 전력 3 mW
Dimensions (W×D×H) 145 × 33 × 17 mm
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MaHa DAQ

Hardware Specifications

Parameter Specification
Input Frequency Range 13.56 MHz ~ 135.6 MHz (Step Size: 13.56 MHz)
Input Channels 4 CH (SMA × 4, BNC × 1)
Input RF Power Range 13.56 MHz ~ 135.6 MHz : 0 dBm ~ -80 dBm
Output Data Simultaneous Measurement of Up to 10 Harmonic Frequencies
Accuracy & Resolution Accuracy: ±0.05 dB / Time Resolution: 1 s

Key Features

PeiREX combines non-invasive plasma sensing technology with Physics-Informed Virtual Metrology (PI-VM) to transform plasma signals into actionable insights for real-world manufacturing processes.

y simultaneously measuring up to 10 harmonic frequencies, our technology enables more precise analysis of plasma behavior and supports stable, predictable plasma-based manufacturing processes.

  • 1

    Easy Installation and Flexible Measurement Locations

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  • @Antena

  • @Matching Box

  • @Electrode

  • @View Port

  • 2

    Multi-Physics and Plasma Information

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  • Plasma Nonlinearity (Wave Behavior, Collisions, Electron Density, Chamber Wall Conditions, etc.)

  • Plasma Sheath and Plasma Impedance

  • RF Power Systems, Impedance Matching, etc.

Application Examples

Through a joint Proof of Concept (PoC) with an equipment manufacturer, MaHa demonstrated the feasibility of RF-based Endpoint Detection (EPD) and successfully detected wafer misalignment during plasma processing.

Process Endpoint Detection Process Endpoint Detection
Wafer Misalignment Detection Wafer Misalignment Detection

Process Endpoint Detection